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Title:
POLYESTER FILM FOR PHOTORESIST
Document Type and Number:
Japanese Patent JP3932074
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a polyester film for the photoresist superior in resolution and free from peeling trouble due to cleavage and elongation at the time of peeling of the polyester film base and superior in the curling resistance of the film base itself.
SOLUTION: The film base is composed of laminate polyester film of layer A and layer B and layer C compositely formed by the coextrusion method, and the laminate polyester film is characterized by having a haze of 0.5-10% and each of a layer A surface roughness ARa and a layer C surface roughness CRa of 0.005-0.05 μm and a refractive index of the laminate polyester film in the film thickness direction of 1.490-1.505.


Inventors:
Noriyasu Kataoka
Takashi Sumiya
Atsushi Matsunaga
Application Number:
JP20322898A
Publication Date:
June 20, 2007
Filing Date:
July 17, 1998
Export Citation:
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Assignee:
TORAY INDUSTRIES,INC.
International Classes:
G03F7/09; B32B27/36; (IPC1-7): G03F7/09; B32B27/36
Domestic Patent References:
JP11348210A
JP8183142A
JP8132575A
JP7333853A
JP7148901A
JP4191045A
JP3083625A
JP62236736A
JP61209155A
JP10128930A
JP4153038A
JP62070046A
Attorney, Agent or Firm:
Toshimitsu Ban



 
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