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Patent Searching and Data


Title:
POLYFLUOROALKYL COMPOUND AND PRODUCTION OF COMPOUND THIN FILM
Document Type and Number:
Japanese Patent JPH03261750
Kind Code:
A
Abstract:

NEW MATERIAL:A compound shown by formula IV [R is group shown by formula V (n is 7-13); X is 6-11C hydrocarbon group and may contain double bond, triple bond or ether chain at any position; Y is hydrophilic group].

EXAMPLE: A compound shown by formula VI.

USE: Useful for producing a compound thin film which has a fluorocarbon chain having excellent hydrophobic nature and a hydrocarbon chain having excellent high orientation at the same time as hydrophobic part of synthetic bimolecule film forming lipid, can use a wide range of organic solvent except water as a solvent to disperse the synthetic lipid and has regular molecular orientation.

PREPARATION: A compound shown by formula I is condensed through dehydration with L-glutamic acid in the presence of a catalyst such as sulfuric acid under heating to form a compound shown by formula II (Q is p-toluenesulfonium ion or sulfate ion) and then active hydrogen group of -NH2 group of the compound shown by formula II is converted into any of various kinds of hydrophilic groups Y to readily give a compound shown by formula IV.


Inventors:
ITAMI YASUO
SHIMIZU RYUICHI
KUNITAKE TOYOKI
Application Number:
JP5901990A
Publication Date:
November 21, 1991
Filing Date:
March 09, 1990
Export Citation:
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Assignee:
JAPAN RES DEV CORP
ITAMI YASUO
SHIMIZU RYUICHI
International Classes:
C08J5/18; C07C233/47; C07C235/12; C07C235/52; C07C237/12; C07C275/16; C07F7/18; C08J5/22; (IPC1-7): C07C233/47; C07C235/12; C07C235/52; C07C237/12; C07C275/16; C07F7/18; C08J5/22
Attorney, Agent or Firm:
Wataru Ogura