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Title:
POLYHEMIACETAL ESTER, COMPOSITION FOR CURED RESIN AND METHOD FOR DEGRADING CURED RESIN
Document Type and Number:
Japanese Patent JP2008214604
Kind Code:
A
Abstract:

To provide a degradable cured resin having advantageous heat resistance, solvent resistance, stability as the cured resin, having excellent degradability of the backbone thereof by heating or irradiating a light and capable of being easily removed; a composition for a cured resin as a raw material for the resin; as well as a novel polyhemiacetal ester capable of being preferably utilized for the composition and method for producing the polyhemiacetal ester.

The polyhemiacetal ester of the present invention comprises a recurring unit represented by formula (1) (wherein, R1 represents a cyclohexyl group or phenyl group; R2 represents a (1-20C) hydrocarbon group; and R3 represents an alkyl (meth)acrylate group having a (1-10C) alkyl group) and has a number average molecular weight of 1,000 to 20,000. The composition for a cured resin of the present invention is characterized by containing the polyhemiacetal ester, a curing agent having in one molecule thereof, one or more polymerizable vinyl group and a heat- or photo acid-generating agent.


Inventors:
HISHIDA YUKIKO
KYO YOSHITETSU
Application Number:
JP2007260762A
Publication Date:
September 18, 2008
Filing Date:
October 04, 2007
Export Citation:
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Assignee:
NOF CORP
International Classes:
C08G63/66; C08F290/14; C08J11/10
Domestic Patent References:
JP2005154496A2005-06-16
JP2004155919A2004-06-03
JPH0782351A1995-03-28
Foreign References:
WO2005100448A12005-10-27
WO2000040641A12000-07-13
Attorney, Agent or Firm:
Hajime Sakai
Masahiro Kurai