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Title:
POLYMER FOR CHEMICAL AMPLIFICATION TYPE PHOTORESIST, AND PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2003176323
Kind Code:
A
Abstract:

To provide a polymer for a chemical amplification type photoresist suitable for ArF excimer laser, and further to provide a photoresist composition.

This polymer for the chemical amplification type photoresist is represented by general formula (I) [wherein, R1 is a hydrogen atom, a 1-10C alkyl group, a 3-12C cycloalkyl group, a 1-10C alkoxy group or a 3-12C cycloalkoxy group; R2 and R4 are each a hydrogen atom or a methyl group; R3 is a cyclohexyl group; R5 is a tert-butyl group, a tetrahydropyranyl group or a 2-methyladamantyl group; (a)/(a+b+c) is 0.2-0.8; (b)/(a+b+c) is 0.05-0.5; and (c)/(a+b+c) is 0.1-0.5].


Inventors:
Arita, Yasushi
Application Number:
JP2002000270854
Publication Date:
June 24, 2003
Filing Date:
September 18, 2002
Export Citation:
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Assignee:
SUMITOMO BAKELITE CO LTD
International Classes:
G03F7/039; C08F220/18; C08F220/28; C08F222/06; C08F232/00; H01L21/027; (IPC1-7): C08F232/00; C08F220/18; C08F220/28; C08F222/06; G03F7/039; H01L21/027