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Title:
POLYMER COMPOUND AND PRODUCTION METHOD THEREOF
Document Type and Number:
Japanese Patent JP2009001730
Kind Code:
A
Abstract:

To provide a self-photocuring polymer compound, which can be used for curing by active energy such as ultraviolet ray with efficient photocuring property, and can minimize odor during the polymerization curing reaction and thus suppress deterioration of the working environment.

The polymer compound includes one or more compound residues represented by the general formula and one or more ethylenic unsaturated double bonds in one molecule.


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Inventors:
MURATA NAOKI
DOI MITSURU
UCHIDA JIRO
ARAKI MOTOAKI
Application Number:
JP2007165968A
Publication Date:
January 08, 2009
Filing Date:
June 25, 2007
Export Citation:
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Assignee:
SHOWA HIGHPOLYMER
International Classes:
C08F20/36; C07C271/16; C08F2/50; C08F8/00; C08F290/12; C08F299/00
Domestic Patent References:
JPH02292307A1990-12-03
JPH02235908A1990-09-18
JP2002226530A2002-08-14
JPH11343311A1999-12-14
JPH0977891A1997-03-25
Attorney, Agent or Firm:
Minoru Terada



 
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