To obtain a polymer compound which is useful in a photoresist composition for fine processing of next generation, a resist composition using the polymer compound as a base polymer and a dissolution controller composed of the polymer compound.
The polymer compound contains an alicyclic group at the side-chain part so as to secure etching resistance and secures transparency of ≤3.0 μm-1 absorption coefficient to light with 157 wavelength by highly fluorinating hydrogen atoms on the ring of the alicyclic group. The alicyclic group is preferably a polycyclic alicyclic group, the high substitution with fluorine is desirably substitution of the whole hydrogen atoms on the ring and namely, the alicyclic group is a perfluoroalicyclic group. The resist composition is composed of the polymer compound as a base polymer. The dissolution controller is composed of the polymer compound.
ENDO KOTARO
TSUJI HIROMITSU
YOSHIDA MASAAKI
HANEDA HIDEO
TAKASU RYOICHI
SATO MITSURU
