Title:
POLYMER COMPOUND, RESIST MATERIAL, AND PROCESS FOR FORMING PATTERN
Document Type and Number:
Japanese Patent JP3874093
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist material which is sensitive to high-energy rays and is excellent in the sensitivity at a wave length of 200 nm or less, especially of 170 nm or less.
SOLUTION: The polymer compound contains repeating units expressed by formulae (1m), (1n) and (1p) (wherein R1 and R2 are each H, F, an alkyl group, or a fluorinated alkyl group, R3 is F or a fluorinated alkyl group; R4 is an acid unstable group; R5a, R5b, R6a and R6b are each H, OH an alkyl group, a fluorinated alkyl group, (CH2)dCO2R7 or (CH2)dC(R8)2(OR7), but R7 is an acid unstable group, a tightly conjunctioning group, a hydrogen atom, an alkyl group, or a fluorinated alkyl group, and R8 is H, F, an alkyl group, or a fluorinated alkyl group; 0≤m<1, 0<n<1, 0≤p<1, 0<m+n+p≤1, but m and p are not 0 at the same time; c is 0 or 1; d is 0 through 6; X is a methylene group, an ethylene group, an oxygen atom or a sulfur atom).
Inventors:
Jun Hatakeyama
Yuji Harada
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Kazuhiko Maeda
Mitsutaka Otani
Haruhiko Komoriya
Yuji Harada
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Kazuhiko Maeda
Mitsutaka Otani
Haruhiko Komoriya
Application Number:
JP2001393354A
Publication Date:
January 31, 2007
Filing Date:
December 26, 2001
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.
International Classes:
C08F220/18; G03F7/039; C08F216/02; C08F232/08; C08F234/00; H01L21/027; (IPC1-7): C08F220/18; C08F216/02; C08F232/08; C08F234/00; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa