Title:
高分子化合物、レジスト材料、及びパターン形成方法
Document Type and Number:
Japanese Patent JP4055401
Kind Code:
B2
Inventors:
Tsunehiro Nishi
Mutsuko Nakajima
Tomohiro Kobayashi
Mutsuko Nakajima
Tomohiro Kobayashi
Application Number:
JP2001363803A
Publication Date:
March 05, 2008
Filing Date:
November 29, 2001
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F234/02; G03F7/039; C08F34/02; C08F220/18; C08F222/06; C08F232/08; C08G61/12; H01L21/027
Domestic Patent References:
| JP2000109545A | ||||
| JP2002538273A | ||||
| JP2000038416A | ||||
| JP2002521534A | ||||
| JP2000159717A |
Foreign References:
| WO2000053657A1 |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa