Title:
高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4061454
Kind Code:
B2
More Like This:
Inventors:
Jun Hatakeyama
Toshiaki Takahashi
Jun Watanabe
Toshinobu Ishihara
Masako Sasako
Masataka Endo
Kishimura Shinji
Mitsutaka Otani
Satoru Miyazawa
Kentaro Tsutsumi
Kazuhiko Maeda
Toshiaki Takahashi
Jun Watanabe
Toshinobu Ishihara
Masako Sasako
Masataka Endo
Kishimura Shinji
Mitsutaka Otani
Satoru Miyazawa
Kentaro Tsutsumi
Kazuhiko Maeda
Application Number:
JP2001070217A
Publication Date:
March 19, 2008
Filing Date:
March 13, 2001
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.
International Classes:
C08G77/24; G03F7/075; C08G77/22; C08K5/00; C08L83/08; G03F7/004; G03F7/039; G03F7/40; H01L21/027
Domestic Patent References:
| JP2002194085A | ||||
| JP2002220471A | ||||
| JP2002055456A | ||||
| JP2003020335A | ||||
| JP2002107932A | ||||
| JP2001288268A | ||||
| JP2002105086A | ||||
| JP2002128788A | ||||
| JP2002268225A | ||||
| JP2002268226A | ||||
| JP2002338690A | ||||
| JP2002332353A |
Foreign References:
| WO2002090423A1 | ||||
| US20020081520 | ||||
| US20020090572 | ||||
| FR2815354A1 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa