Title:
高分子化合物、レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5095048
Kind Code:
B2
Inventors:
Tsunehiro Nishi
Takeshi Watanabe
Jun Hatakeyama
Tsuyoshi Kanao
Koji Hasegawa
Seiichiro Tachibana
Takeshi Watanabe
Jun Hatakeyama
Tsuyoshi Kanao
Koji Hasegawa
Seiichiro Tachibana
Application Number:
JP2000342815A
Publication Date:
December 12, 2012
Filing Date:
November 10, 2000
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F232/00; G03F7/039; C08G61/08; C08G61/12; C08K5/00; C08L45/00; C08L65/00; G03F7/38; H01L21/027
Domestic Patent References:
| JP200026541A |
Foreign References:
| WO1997033198A1 | ||||
| WO1999014635A1 | ||||
| WO1999042510A1 | ||||
| WO1999042502A1 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa