Title:
POLYMERIC MATERIALS WITH NEGATIVE PHOTOELASTIC CONSTANTS
Document Type and Number:
Japanese Patent JP2020114915
Kind Code:
A
Abstract:
To provide polymeric materials having negative photoelastic constants.SOLUTION: A polymeric material comprises: (a) a polymer comprising polymerized units of 2-vinylpyridine, 4-vinylpyridine, methyl methacrylate or a combination thereof; (b) an organic compound selected from the group consisting of an aromatic monocarboxylic acid having 1-5 substituents selected from the group consisting of fluoro and chloro on the ring, a specific biphenyl compound optionally having substituents, and a C9-C25 aliphatic polycyclic compound; and (c) an organic compound having a boiling point of at least 200°C.SELECTED DRAWING: None
Inventors:
PRAVEEN AGARWAL
JUSTICE ALABOSON
CHANG SHIH-WEI
JOHN W LYONS
KATHLEEN M O'CONNELL
CAROLINE WOELFLE-GUPTA
ZHOU WEIJUN
JUSTICE ALABOSON
CHANG SHIH-WEI
JOHN W LYONS
KATHLEEN M O'CONNELL
CAROLINE WOELFLE-GUPTA
ZHOU WEIJUN
Application Number:
JP2020033684A
Publication Date:
July 30, 2020
Filing Date:
February 28, 2020
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
DOW GLOBAL TECHNOLOGIES LLC
DOW GLOBAL TECHNOLOGIES LLC
International Classes:
C08L39/08; C08F26/06; C08J5/18; C08K5/09; G02F1/13363
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office