Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
POLYMER, AND PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2012107257
Kind Code:
A
Abstract:

To provide a spirocyclic olefin polymer, a method of preparing a spirocyclic olefin polymer, and a photoresist composition including a spirocyclic olefin resin binder.

There is provided a polymer containing one or more spirocyclic olefin monomers as a polymerization unit and optionally one or more ethylenically or acetylenically unsaturated monomers. The spirocyclic olefin monomers are bound to the polymer backbone through olefinic carbons. In addition, there is also provided a method of forming a polymer containing one or more spirocyclic olefin monomers as a polymerization unit by polymerizing one or more spirocyclic olefin monomers. The method includes a step of contacting one or more spirocyclic olefin monomers with one or more catalysts selected from a palladium (II) polymerization catalyst, a nickel (II) polymerization catalyst or a free radical polymerization catalyst.


Inventors:
SZMANDA CHARLES R
BARCLAY GEORGE G
TREFONAS PETER III
YUEH WANG
Application Number:
JP2012040722A
Publication Date:
June 07, 2012
Filing Date:
February 27, 2012
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C08F10/00; C08F4/00; C08F32/00; C08F4/26; C08F4/28; C08F4/80; C08F32/08; C08F222/04; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JP2002538273A2002-11-12
JP2000508080A2000-06-27
JP2002519487A2002-07-02
JP2002515061A2002-05-21
JPH11505877A1999-05-25
JPH11505880A1999-05-25
JPH04503375A1992-06-18
JPH10319595A1998-12-04
JPH0990637A1997-04-04
JPH08305014A1996-11-22
JP2001125270A2001-05-11
JPH11269234A1999-10-05
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office