Polymer, a polymer film, and a manufacturing method for the same

Japanese Patent JP6010096

B2

A method for preparing a polymeric material includes: providing a polymeric matrix having at least one polymer and at least one porogen; and degrading the at least one porogen at a temperature T≰1.1 Tg, where Tg is a glass transition temperature of the polymeric matrix. The degrading step includes exposing the polymeric matrix to thermal degradation, chemical degradation, electrical degradation and/or radiation degradation, wherein the polymeric material has a permeability at least 1.2 times a permeability of the polymeric matrix for a gas, and a selectivity of the polymeric material is at least 0.35 times a selectivity of the polymeric matrix for a gas pair. The method preferably provides gas separation membranes that exceed Robeson's upper bound relationship for at least one gas separation pair. Novel polymeric materials, gas separation membranes and fluid component separation methods are also described.

Xin Chen
Lloyd Marlon Robson
Milton Keith Murphy
Jeffrey Raymond Quay

JP2014248093A

October 19, 2016

December 08, 2014

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AIR PRODUCTS AND CHEMICALS INCORPORATED

B01D69/02; B01D67/00; B01D69/08; B01D71/44; B01D71/48; B01D71/50; B01D71/52; B01D71/56; B01D71/62; B01D71/64; B01D71/66; B01D71/68

JP8141350A
JP8155282A
JP2003236352A
JP2009072781A

US20070209506
US4764320
WO2009059360A1

Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi
Satoshi Deno
Naoki Kobayashi

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