To obtain a chemical amplification type resist which is sensitive to the far UV light of KrF excimer laser or ArF excimer laser, by using a multi-component copolymer whose main chain repeating units are produced from maleic acid, a norbornene derivative containing a carboxylic acid in a side chain, and a norbornene derivative containing an acid-dissociating action group.
This chemical amplification type resist uses a multi-component copolymer which is prepresented by formula I [X is a norbornene derivative that contains an acid-dissociating action group in a side chain and is selected from groups of formula II and formula III (R1 is t-butyloxycarbonyl group or the like; R2 is H, a 1-10C linear alkyloxycarbonyl or the like; R3 is methyl, ethyl or the like); Y is a norbornene derivative containing a carboxylic acid of formula IV: (l)+(m)+(n)+(o)=1; the content ratio of (o) is 0.4-0.6; the content ratios of (l), (m) and (n) are each ≤0.5, respectively], and has an average mol. wt.(Mw) of 3,000-50,000 (converted into polystyrene standard) and a mol.wt. distribution (Mw/Mn ratio) of 1.0-2.0.
PARK SUN-YI
PARK JOO-HYEON
KIM SON-JU
