Title:
POLYMER FOR PRODUCING RADIATION-SENSITIVE RESIST AND RESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3120078
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a chemical amplification type resist which is sensitive to the far UV light of KrF excimer laser or ArF excimer laser, by using a multi-component copolymer whose main chain repeating units are produced from maleic acid, a norbornene derivative containing a carboxylic acid in a side chain, and a norbornene derivative containing an acid-dissociating action group.
SOLUTION: This chemical amplification type resist uses a multi-component copolymer which is prepresented by formula I [X is a norbornene derivative that contains an acid-dissociating action group in a side chain and is selected from groups of formula II and formula III (R1 is t-butyloxycarbonyl group or the like; R2 is H, a 1-10C linear alkyloxycarbonyl or the like; R3 is methyl, ethyl or the like); Y is a norbornene derivative containing a carboxylic acid of formula IV: (l)+(m)+(n)+(o)=1; the content ratio of (o) is 0.4-0.6; the content ratios of (l), (m) and (n) are each ≤0.5, respectively], and has an average mol. wt.(Mw) of 3,000-50,000 (converted into polystyrene standard) and a mol.wt. distribution (Mw/Mn ratio) of 1.0-2.0.
Inventors:
Seo Dong-Chur
Paksung-i
Park Joo-hyun
Kim Sung-Ju
Paksung-i
Park Joo-hyun
Kim Sung-Ju
Application Number:
JP20242999A
Publication Date:
December 25, 2000
Filing Date:
July 16, 1999
Export Citation:
Assignee:
Corea Khunho Petrochemical Company Limited
International Classes:
C08F232/08; C08G61/08; C08G63/54; C08L35/02; C08F222/06; G03F7/039; G03F7/004; (IPC1-7): C08F222/06; C08F232/08; C08G63/54; C08L35/02; G03F7/039
Domestic Patent References:
| JP10218947A | ||||
| JP10130340A | ||||
| JP10316720A | ||||
| JP11279122A |
Attorney, Agent or Firm:
Yoshihiro Kodama