Title:
POLYMER REMOVER
Document Type and Number:
Japanese Patent JP2002038197
Kind Code:
A
Abstract:
To provide a stripper and a polymer remover to be used after etching capable of removing effectively polymeric materials, compatible with the environment, free from damaging structure and geometry, causing no erosion to a base body, especially to metallic thin film, and etching no dielectric layer on the base body.
The composition for removing polymeric materials from a base body contains ≥1 polyol compounds, ≥1 glycol ethers, water, a fluoride salt selected from ammonium fluoride, ammonium hydrogen fluoride, ammonium- tetramethylammonium hydrogen fluoride and their mixture, and optionally ≥1 additives, and the content of water is at least 5 wt.% based on the whole weight of the composition.
Inventors:
SAHBARI JAVAD J
Application Number:
JP2001087852A
Publication Date:
February 06, 2002
Filing Date:
March 26, 2001
Export Citation:
Assignee:
SHIPLEY CO LLC
International Classes:
C09D9/00; C11D7/10; C11D7/26; C11D7/28; C11D7/32; C11D7/34; C11D7/50; C11D7/60; C11D17/08; G03F7/42; H01L21/02; H01L21/302; H01L21/304; H01L21/311; H01L21/3213; (IPC1-7): C11D7/60; C11D7/10; C11D7/26; C11D7/28; C11D7/32; C11D7/34; C11D7/50; C11D17/08; G03F7/42; H01L21/304; H01L21/3065
Attorney, Agent or Firm:
Minoru Senda (2 outside)
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