Title:
POLYMER REMOVING SOLUTION COMPOSITION FOR FINE PATTERN
Document Type and Number:
Japanese Patent JP2001305752
Kind Code:
A
Abstract:
To provide a polymer removing solution having both low corrosiveness to metals and high polymer removing property.
The objective polymer removing solution composition contains (1) at least one fluoride salt or difluoride salt comprising hydrofluoric acid and one selected form the group comprising ammonia, hydroxylamines, aliphatic amines, aromatic amines and aliphatic or aromatic quaternary ammonium salts, (2) at least one oxygen-containing organic solvent selected from alcohols and ketones and (3) water.
Inventors:
KEZUKA TAKEHIKO
ITANO MITSUSHI
ITANO MITSUSHI
Application Number:
JP2000125237A
Publication Date:
November 02, 2001
Filing Date:
April 26, 2000
Export Citation:
Assignee:
DAIKIN IND LTD
International Classes:
C09D9/00; C11D3/02; C11D3/43; C11D7/10; C11D7/50; C11D11/00; G03F7/42; H01L21/027; H01L21/306; (IPC1-7): G03F7/42; C09D9/00; H01L21/027; H01L21/306
Attorney, Agent or Firm:
Eiji Saegusa (6 others)
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