Title:
POLYMER, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2013035942
Kind Code:
A
Abstract:
To provide a resist composition excellent in lithography characteristics, a novel polymer useful as the resist composition, and a method for forming a resist pattern using the resist composition.
The polymer has an anion site to generate an acid on at least one terminal of the main chain by exposure, and two structural units (a1) each containing an acid decomposing group whose polarity increases by the action of the acid, and having activation energies different by ≥3.0 kJ/mol. The resist composition contains the polymer.
Inventors:
UTSUMI YOSHIYUKI
DAZAI NAOHIRO
DAZAI NAOHIRO
Application Number:
JP2011173181A
Publication Date:
February 21, 2013
Filing Date:
August 08, 2011
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
C08G85/00; C08F22/20; G03F7/004; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi