Title:
ポリマー、ポリマーを含んでなる半導体組成物、および半導体組成物を用いた膜の製造方法
Document Type and Number:
Japanese Patent JP7423627
Kind Code:
B2
Abstract:
To provide a novel polymer capable of reducing sublimate during film formation and a composition comprising the same. The polymer (A) according to the present invention comprises at least one structural unit selected from the group consisting of Unit (a), Unit (b), Unit (c) and Unit (d) having certain structures, wherein, na, nb, nc and nd, which are the numbers of repetition respectively of Units (a), (b), (c) and (d), satisfy the following formulae: na+nb>0, nc≥0 and nd≥0.
Inventors:
Hiroshi Incheon
Tomohide Katayama
Tomotsugu Yano
Zhang Rui
Aritaka Hishida
Masato Suzuki
Rikio Kozaki
Satoshi Okamura
Tomohide Katayama
Tomotsugu Yano
Zhang Rui
Aritaka Hishida
Masato Suzuki
Rikio Kozaki
Satoshi Okamura
Application Number:
JP2021529346A
Publication Date:
January 29, 2024
Filing Date:
February 17, 2020
Export Citation:
Assignee:
Merck Patent Gesellschaft mit beschraenkter Haftung
International Classes:
G03F7/11; C08F220/10; C08F220/26; C08F220/34; C08L33/14; H01L21/027
Domestic Patent References:
| JP2016224282A | ||||
| JP2008257166A | ||||
| JP2018025649A | ||||
| JP2011520148A |
Foreign References:
| WO2017170828A1 |
Attorney, Agent or Firm:
Yukitaka Nakamura
Manabu Miyajima
Hideaki Maekawa
Itsuko Endo
Manabu Miyajima
Hideaki Maekawa
Itsuko Endo