Title:
POLYMER SOLUTION CONCENTRATION METHOD
Document Type and Number:
Japanese Patent JP2016044276
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a polymer solution concentration method in which the splash entrainment into the decompression line during the concentration is suppressed and in which the evaporation rate is high.SOLUTION: Provided is a polymer solution concentration method for concentrating a polymer solution in an evaporator 4, and in which, characterized, the evaporator includes a decompression means 24 for decompressing the inside of the evaporator, an atomization means 26 for changing the polymer solution to an atomized body within the evaporator, and a recirculation means 8 for feeding the polymer solution to the atomization means, and the atomized body is atomized in a hollow body shape toward the liquid surface of the polymer solution.SELECTED DRAWING: Figure 1
Inventors:
HIRAI SHU
ARAO DAICHI
ARAO DAICHI
Application Number:
JP2014171252A
Publication Date:
April 04, 2016
Filing Date:
August 26, 2014
Export Citation:
Assignee:
NIPPON ZEON CO
International Classes:
C08F6/10
Domestic Patent References:
JP2004027009A | 2004-01-29 | |||
JP2001040031A | 2001-02-13 | |||
JP2005513223A | 2005-05-12 |
Attorney, Agent or Firm:
Yoshihiro Fujimoto
Previous Patent: COATING LIQUID, COATED FILM AND COMPOSITE MATERIAL
Next Patent: ADHESIVE COMPOSITION AND METHOD FOR BONDING ELECTRONIC COMPONENT
Next Patent: ADHESIVE COMPOSITION AND METHOD FOR BONDING ELECTRONIC COMPONENT