POLYMER SUBSTRATE WITH CURED RESIN LAYER HAVING UNEVENNESS

Title:

POLYMER SUBSTRATE WITH CURED RESIN LAYER HAVING UNEVENNESS

Document Type and Number:

Japanese Patent JP2004351744

Kind Code:

A

Abstract:

To provide a substrate having a light scattering function (the so-called glare protection function) which hardly causes a flicker in the screen, even when the substrate is applied to a high definition display.

This polymer substrate has a cured resin layer with an unevenness of specified roughness formed on the surface of a substantially uniformly dispersed ultrafine particle composed of a metallic oxide and/or a metallic fluoride with an average primary particle diameter of not more than 100 nm, on at least one surface of a transparent polymer substrate.

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Inventors:

SHIRAISHI ISAO
ITO HARUHIKO
MIKOSHIBA HITOSHI

Application Number:

JP2003152143A

Publication Date:

December 16, 2004

Filing Date:

May 29, 2003

Export Citation:

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Assignee:

TEIJIN LTD

International Classes:

G02F1/1335; B32B27/18; H04N5/72; (IPC1-7): B32B27/18; G02F1/1335; H04N5/72

Attorney, Agent or Firm:

Hideko Mihara

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