Title:
POLYMERASE CHAIN REACTION DEVICE HAVING INTEGRATED MICROWELL
Document Type and Number:
Japanese Patent JP3041423
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a polymerase chain reaction device having integrated microwells capable of carrying out many DNA analyses at a micro sample by forming an assemblage composed of plural microwells on a semiconductor base plate and composing it so as to carry out polymerase chain reaction in each well.
SOLUTION: By initially forming an SiO2 film 6 by means of wet heat oxidation at 1000°C for 8 hours on the surface 5 of silicon wafer of 500 μm thick out off in the size of 30 nm×30 nm, applying a negative type photoresist on the one side by means of spin coating, exposing it through a photomask, removing the excessive resist after being developed, immersing an oxidized film revealed on the surface in an acidic solution to remove it, finally carrying out anisotropic etching and further similar lithograph to form microwell assemblage 1 composed of integrated plural microwells 3 on the semiconductor base plate 2 and composing it so as to respectively carry out polymerase chain reactions in respective microwells, the objective device, the microwell inside 4 of which is hydrophilic and the surface 5 of the base plate is hydrophobic, is provided.
Inventors:
Tamiya, Eiichi
Yokoyama, Kenji
Murakami, Yuji
Sakaguchi, Toshifumi
Morita, Suketaka
Nagai, Shusuke
Idegami, Kotaro
Yokoyama, Kenji
Murakami, Yuji
Sakaguchi, Toshifumi
Morita, Suketaka
Nagai, Shusuke
Idegami, Kotaro
Application Number:
JP1999000040811
Publication Date:
March 10, 2000
Filing Date:
February 19, 1999
Export Citation:
Assignee:
JAPAN ADVANCED INST OF SCIENCE & TECHNOLOGY HOKURIKU
International Classes:
C12N15/09; C12M1/00; C12Q1/68; H01L49/00; (IPC1-7): C12N15/09; C12M1/00; C12Q1/68; H01L49/00