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Title:
POLYMERIC COMPOUND, MATERIAL FOR ANTIREFLECTION FILM AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP3712043
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To obtain a material for an antireflection film excellent in dimensional accuracy and aligning accuracy and capable of reproducibly forming a fine resist pattern.
SOLUTION: The polymeric compound is obtained by polymerizing a cyclic perfluoro monomer and a perfluorocarbon monomer bearing a sulfonyl group in its side chain. The material for an antireflection film comprises this polymeric compound. A resist pattern is formed using this material.


Inventors:
Hatakeyama, Jun
Application Number:
JP2000000013164
Publication Date:
November 02, 2005
Filing Date:
January 21, 2000
Export Citation:
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Assignee:
SHIN ETSU CHEM CO LTD
International Classes:
G03F7/11; C08F232/04; C08F234/02; C08F290/06; H01L21/027; (IPC1-7): C08F232/04; C08F234/02; G03F7/11; H01L21/027
Domestic Patent References:
JP58038707A
JP10045853A
Attorney, Agent or Firm:
小島 隆司
西川 裕子



 
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