Title:
POLYMERIC COMPOUND, MATERIAL FOR ANTIREFLECTION FILM AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP3712043
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a material for an antireflection film excellent in dimensional accuracy and aligning accuracy and capable of reproducibly forming a fine resist pattern.
SOLUTION: The polymeric compound is obtained by polymerizing a cyclic perfluoro monomer and a perfluorocarbon monomer bearing a sulfonyl group in its side chain. The material for an antireflection film comprises this polymeric compound. A resist pattern is formed using this material.
Inventors:
Jun Hatakeyama
Application Number:
JP2000013164A
Publication Date:
November 02, 2005
Filing Date:
January 21, 2000
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/11; C08F232/04; C08F234/02; C08F290/06; H01L21/027; (IPC1-7): C08F232/04; C08F234/02; G03F7/11; H01L21/027
Domestic Patent References:
| JP58038707A | ||||
| JP10045853A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa