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Title:
POLYMERIZABLE MONOMER, POLYMERIC COMPOUND, POSITIVE RESIST MATERIAL AND PATTERN FORMING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2013227433
Kind Code:
A
Abstract:

To provide a polymeric compound suitable as a positive resist material giving a resist film that has higher resolution than a conventional positive resist material, has small line edge roughness and a good pattern profile after exposure, and has excellent etching durability and a little amount of outgassing during exposure, and in particular, suitable for a base resin of a chemically amplified positive resist material, and to provide a positive resist material and a pattern forming method using the polymeric compound, and a polymerizable monomer for obtaining the polymeric compound.

A polymerizable monomer is represented by general formula (1) (wherein R1 represents a methyl group, ethyl group, propyl group, vinyl group or ethynyl group; the circle represents a cyclic bridged cyclic cycloalkyl group having 3 to 12 carbon atoms, which may include a double bond, however, it is not allowed that the circle is a cyclohexyl group and R1 is an ethyl group; R2 represents a hydrogen atom, a 1-4C straight-chain, branched or cyclic alkyl group; and m represents an integer of 1 to 4). The positive resist material shows a high contrast of an alkaline dissolution rate before and after exposure, suppresses swelling in an alkali developing solution, thereby preventing pattern collapse and achieving high resolution, has a good pattern profile and a good condition of edge roughness after exposure, and in particular, suppresses an acid diffusion rate and shows excellent etching durability.


Inventors:
Hatakeyama, Jun
Hasegawa, Koji
Application Number:
JP2012000100568
Publication Date:
November 07, 2013
Filing Date:
April 26, 2012
Export Citation:
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Assignee:
SHIN-ETSU CHEMICAL CO LTD
International Classes:
C08F12/22; C07C43/243; C08F212/00; C08F212/14; C08F220/38; C08F232/00; G03F7/039; H01L21/027
Domestic Patent References:
JP2002162746A2002-06-07
JP2007092018A2007-04-12
JP2007206091A2007-08-16
JP2001158808A2001-06-12
JP2010237662A2010-10-21
JP2007240729A2007-09-20
JP2002162746A2002-06-07
JP2007092018A2007-04-12
JP2007206091A2007-08-16
JP2001158808A2001-06-12
Foreign References:
Other References:
JPN6014032572; Hideyuki Otsuka,Takeo Sato,Takeshi Endo: 'Synthesis and controlled polymerization of p-(1-methylcyclohexyloxy)styrene and quick-response deblo' Macromol.Rapid Commun. vol.21, 2000, p.48-52
Attorney, Agent or Firm:
小島 隆司
重松 沙織
小林 克成
石川 武史