To obtain a polymerizable unsaturated compound for a photoresist suitable for obtaining a stable high molecular compound for a photoresist which does not cause a change with the elapse of time.
The polymerizable unsaturated compound used as a monomer of a high molecular compound for a photoresist has ≤200 (mg-KOH/g) acid value and may be a compound of formula 1 [where Ra is H or methyl; Rb and Rc are the same or different and are each H or a hydrocarbon group which may have a substituent, Rb and Rc may bond to each other to form an alicyclic hydrocarbon ring which may have a substituent together with adjacent C; X is a combining group; the ring Z is a mono- or polycyclic aromatic or alicyclic hydrocarbon ring which may have a substituent; and (i), (j) and (k) are each 0 or 1].
ARAI TAKASHI
TSUNO MASUMI
MICHITSU KUNIHIKO
