Title:
重合体、ポジ型レジスト組成物、およびレジストパターン形成方法
Document Type and Number:
Japanese Patent JP6801679
Kind Code:
B2
Abstract:
A polymer includes a monomer unit (A) represented by general formula (I), shown below, and a monomer unit (B) represented by general formula (II), shown below, wherein at least one of the monomer unit (A) and the monomer unit (B) includes at least one fluorine atom. In the formulae, R 1 is a chlorine atom, a fluorine atom, or a fluorine atom-substituted alkyl group, R 2 is an unsubstituted alkyl group or a fluorine atom-substituted alkyl group, R 3 to R 6 , R 8 , and R 9 are each a hydrogen atom, a fluorine atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, R 7 is a hydrogen atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, p and q are each an integer of at least 0 and not more than 5, and p + q = 5.
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Inventors:
Manabu Hoshino
Application Number:
JP2017564220A
Publication Date:
December 16, 2020
Filing Date:
January 20, 2017
Export Citation:
Assignee:
Zeon Corporation
International Classes:
C08F220/22; C08F212/06; C08F212/14; G03F7/039; G03F7/20; G03F7/32; H01L21/027
Domestic Patent References:
| JP57118243A | ||||
| JP5949536A | ||||
| JP61170735A | ||||
| JP2115852A | ||||
| JP2011215243A | ||||
| JP2016218321A | ||||
| JP5983157A |
Foreign References:
| WO1999062964A1 |
Attorney, Agent or Firm:
Kenji Sugimura
Mitsutsugu Sugimura
Yuta Terashima
Hitomi Yuki
Mitsutsugu Sugimura
Yuta Terashima
Hitomi Yuki