Title:
高分子溶液内の残留触媒の除去方法およびこれによって精製された高分子
Document Type and Number:
Japanese Patent JP5140086
Kind Code:
B2
Abstract:
Disclosed is a method for removing a metallic compound catalyst residue from a polymer solution which is prepared in the presence of a catalyst containing metal of Group 10 using a thiourea compound, a polymer from which the metallic compound catalyst residue is removed using the method, and a film produced using the method.
Inventors:
Yoon, Seung-Chul
Jeong, Hae Young
Jeong, Song-ho
Jeong, Hae Young
Jeong, Song-ho
Application Number:
JP2009536161A
Publication Date:
February 06, 2013
Filing Date:
November 07, 2007
Export Citation:
Assignee:
LG HAUSYS,LTD.
International Classes:
C08F6/08; C08F4/80; C08F32/08
Domestic Patent References:
| JP2002284820A | ||||
| JP2003299905A | ||||
| JP2008101169A | ||||
| JP36008336B1 | ||||
| JP2004518813A | ||||
| JP57174142A | ||||
| JP2001164373A |
Foreign References:
| KR1020040080467A |
Attorney, Agent or Firm:
Ikeuchi, Sato & Partners