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Patent Searching and Data


Title:
POLYPHENYLENE ETHER-BASED RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2000281893
Kind Code:
A
Abstract:

To provide a polyphenylene ether-based resin composition which has improved processability and gives molded articles having excellent surfaces.

This polyphenylene ether-based resin composition comprises 100 pts.wt. of (A-1) a polyphenylene ether-based resin or (A-1) the polyphenylene ether-based resin and (A-2) a polystyrene-based resin, and (B) polytetrafluoroethylene-containing mixture powder comprising polytetrafluoroethylene particles having particle diameter of ≤10 μm and an organic polymer so that the content of the polytetrafluoroethylene component is 0.0001-20 pts.wt.


Inventors:
KOSHIRAI ATSUNORI
NISHIDA KOJI
Application Number:
JP9503799A
Publication Date:
October 10, 2000
Filing Date:
April 01, 1999
Export Citation:
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Assignee:
MITSUBISHI RAYON CO
International Classes:
C08L101/00; C08L25/04; C08L27/18; C08L71/12; C08L101/16; (IPC1-7): C08L71/12; C08L25/04; C08L27/18; C08L101/16