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Patent Searching and Data


Title:
POLYPHENYLENE ETHER RESIN COMPOSITION OF IMPROVED LIGHT RESISTANCE
Document Type and Number:
Japanese Patent JPH0649350
Kind Code:
A
Abstract:

PURPOSE: To obtain a composition improved in light resistance excellent in heat and impact resistances by mixing a polyphenylene ether resin with a specified compound in a specified mixing ratio.

CONSTITUTION: The composition comprises 100 pts.wt. polyphenylene ether resin or mixture thereof with a styrene resin [e.g. poly(2,6-dimethyl-1,4-phenylene) ether] and 0.01-5 pts.wt. compound of the formula: R-AnBn'-R' {wherein A is a bivalent group of formula I, B is a bivalent group of formula II [wherein R1 and R2 are each H, 1-12C alkyl or aryl; R, R' and R3 to R5 are each H, 1-8C alkyl aryl or aralkyl with 1-8C alkyl, or any two of them together with an oxygen atom may form a siloxane ring; X is -CmH2m-C(=O)O (wherein m is 1-3); Y is a single bond when A is bonded to R, or is O in the other cases; n is 1 or greater; n' is 0 or greater; As and Bs may be bonded to each other to form blocks or may be bonded randomly]}.


Inventors:
INOUE KAZUNARI
Application Number:
JP22061092A
Publication Date:
February 22, 1994
Filing Date:
July 28, 1992
Export Citation:
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Assignee:
GE PLASTICS JAPAN LTD
International Classes:
C08L25/04; C08G77/388; C08K5/544; C08L55/00; C08L55/02; C08L71/00; C08L71/12; C08L73/00; (IPC1-7): C08L71/12; C08L71/12; C08K5/54; C08L25/04; C08L55/02
Attorney, Agent or Firm:
Mitsuo Matsui