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Title:
POLYPROPYLENE RESIN COMPOSITION FOR METAL VAPOR- DEPOSITED FILM, FILM FOR METAL VAPOR DEPOSITION AND METAL VAPOR-DEPOSITED FILM COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2003176389
Kind Code:
A
Abstract:

To provide a metal vapor-deposited film having excellent rigidity, heat sealability, blocking resistance and surface scuff properties with a slight soluble component and excellent adhesion of a vapor-deposited film, printability on a vapor-deposited surface and laminating properties on the vapor-deposited surface and a resin composition capable of affording the film.

This metal vapor-deposited film is obtained by using a polypropylene resin composition for the metal vapor-deposited film comprising a specific antiblocking agent, a specified antioxidant and hydrotalcites in a propylene random copolymer composed of 88-99.5 mol% of propylene units, 0.5-12 mol% of ethylene and/or butene units, 115-150°C melting point, 1-30 g/10 min melt flow rate (MFR), ≤1.5 wt.% soluble content at ≤20°C measured by a cross fractionating chromatography, ≤6.0×104 weight-average molecular weight of the soluble content, ≤4.0 wt.% soluble content at ≤40°C and ≤8.0×104 weight-average molecular weight of the soluble content.


Inventors:
NAKAMURA YASUNORI
KANAI GEN
OMORI HIROSHI
TAYANO TAKAO
UCHINO HIDEFUMI
Application Number:
JP2002279191A
Publication Date:
June 24, 2003
Filing Date:
September 25, 2002
Export Citation:
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Assignee:
JAPAN POLYCHEM CORP
International Classes:
C08J5/18; C08K3/34; C08K7/22; C08L23/14; C08L23/16; C23C14/20; (IPC1-7): C08L23/14; C08J5/18; C08K3/34; C08K7/22; C08L23/16; C23C14/20
Domestic Patent References:
JPH11302470A1999-11-02
JPH09241447A1997-09-16
JP2001261866A2001-09-26
JPH01247427A1989-10-03
JPH05178607A1993-07-20
JP2003064194A2003-03-05
JP2002356564A2002-12-13