Title:
多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
Document Type and Number:
Japanese Patent JP4139710
Kind Code:
B2
Abstract:
Provided is a coating liquid for forming a porous film having desirably controlled thickness and having excellent dielectric and mechanical properties, using the conventional semiconductor process. Specifically, provided is a composition for forming a porous film comprising a condensation product and an organic solvent wherein the condensation product is obtained by hydrolysis and condensation, at presence of a basic catalyst, of
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Inventors:
Tsutomu Ogiwara
Fujio Yagihashi
Hideo Nakagawa
Masako Sasako
Fujio Yagihashi
Hideo Nakagawa
Masako Sasako
Application Number:
JP2003062605A
Publication Date:
August 27, 2008
Filing Date:
March 10, 2003
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Matsushita Electric Industrial Co., Ltd
International Classes:
B05D7/24; C09D183/14; B32B25/20; C01B33/12; C08G77/50; C08J5/18; C08L83/14; C09D7/12; H01L21/31; H01L21/312; H01L21/768
Domestic Patent References:
| JP2001137776A |
Attorney, Agent or Firm:
Shoichi Okuyama
Arihara Koichi
Matsushima Tetsuo
Hidefumi Kawamura
Arihara Koichi
Matsushima Tetsuo
Hidefumi Kawamura