Title:
POROUS MEMBRANE
Document Type and Number:
Japanese Patent JP2016013544
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a porous membrane which is hardly clogged by a fouling substance and which is high in filtration efficiency.SOLUTION: The surface of a resin porous substrate is irradiated with an ionization radiation to create radicals, and the created radicals and chemical compounds containing bases reactive with the radicals are graft-polymerized, to prepare a fluid treatment resin porous film, in which molecular chains existing in a surface part have graft chains, in which the graft ratio is 0.1 to 5%, in which the contact angle of water is 80° or less, and in which the resin porous substrate is a fluororesin containing porous substrate.
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Inventors:
OMUKAI YOSHIKAGE
SATO KAZUYUKI
OSHIMA AKIHIRO
SATO KAZUYUKI
OSHIMA AKIHIRO
Application Number:
JP2015119525A
Publication Date:
January 28, 2016
Filing Date:
June 12, 2015
Export Citation:
Assignee:
DAIKIN IND LTD
UNIV OSAKA
UNIV OSAKA
International Classes:
B01D71/78; B01D69/02; B01D71/32; C08F259/08; C08J9/36
Domestic Patent References:
| JPH0198640A | 1989-04-17 | |||
| JPS62110978A | 1987-05-22 | |||
| JP2009183804A | 2009-08-20 | |||
| JPH07124454A | 1995-05-16 |
Foreign References:
| WO2004035180A1 | 2004-04-29 |
Attorney, Agent or Firm:
Samejima Mutsumi
Kyousei Tamura
Yoshida Tamaki
Kyousei Tamura
Yoshida Tamaki
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