Title:
POROUS SILICON MATERIAL, ELECTRIC STORAGE DEVICE AND METHOD FOR MANUFACTURING POROUS SILICON MATERIAL
Document Type and Number:
Japanese Patent JP2023167229
Kind Code:
A
Abstract:
To provide a material containing Si in which the lowering of charge/discharge characteristics is more reduced.SOLUTION: A porous silicon material of the present disclosure is in a particulate state. Si and a transition metal silicide containing a transition metal element M coexist in a skeleton part. The Si phase in the whole particle accounts for 55 mass% or more, and the transition metal silicide accounts for 1 mass% or more and 45 mass% or less. The porous silicon material contains 20 vol.% or more of pores of 1 μm or less by a mercury indentation method, and has a two-layer structure in which the transition metal silicide is segregated in either a core part of the center or a shell part of the surface layer.SELECTED DRAWING: Figure 9
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Inventors:
MATSUBARA MASAHARU
SUZUKI RYO
NAGAMEGURI NAOYUKI
OISHI KEIICHIRO
KAWAURA HIROYUKI
KONDO YASUHITO
WASEDA TETSUYA
YOSHIDA ATSUSHI
UCHIYAMA TAKAYUKI
SUZUKI RYO
NAGAMEGURI NAOYUKI
OISHI KEIICHIRO
KAWAURA HIROYUKI
KONDO YASUHITO
WASEDA TETSUYA
YOSHIDA ATSUSHI
UCHIYAMA TAKAYUKI
Application Number:
JP2022078245A
Publication Date:
November 24, 2023
Filing Date:
May 11, 2022
Export Citation:
Assignee:
TOYOTA CENTRAL RES & DEV
TOYOTA MOTOR CORP
TOYOTA MOTOR CORP
International Classes:
C01B33/06; C01B33/02; H01G11/24; H01G11/26; H01G11/30; H01G11/62; H01G11/86; H01M4/36; H01M4/38
Attorney, Agent or Firm:
Patent Attorney Corporation ITEC International Patent Office