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Title:
POSITION DETECTOR
Document Type and Number:
Japanese Patent JPS6063927
Kind Code:
A
Abstract:
PURPOSE:To enable a highly accurate detection of the position even when a reticle window is unclear due to an insufficient quantity of light from a wafer, by providing a reflecting plate near the wafer and by shifting the plate to the center of a reducing lense with a step feeding mechanism. CONSTITUTION:A reflecting plate 11 is disposed near a wafer 1, and is shifted to the center of a reducing lense 3 with a step feeding mechanism, while the position thereof is measured by a position detecting machanism. The outputs of the X and Y detectors at this moment present clear waveforms of the reticle windows 10, thereby La and Lb can be easily detected. Then the wafer 1 is shifted to the center of the reducing lense 3 to detect the target pattern. The outputs of the X and Y detectors at this moment enable detection of Lc and Ld. Thus, a difference between the both patterns can be obtained.

Inventors:
HAYASHI SOUICHIROU
TSUYUKI HISAMASA
Application Number:
JP17114583A
Publication Date:
April 12, 1985
Filing Date:
September 19, 1983
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G03F9/00; H01L21/027; H01L21/30; (IPC1-7): G03F9/00
Attorney, Agent or Firm:
Akio Takahashi



 
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