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Patent Searching and Data


Title:
POSITION MONITOR
Document Type and Number:
Japanese Patent JPH01193684
Kind Code:
A
Abstract:

PURPOSE: To accurately measure the position of ion beam, by allowing heavy ion beam to pass through a membrane and measuring the intensity distribution of ion beam excited at that time.

CONSTITUTION: A carbon membrane 1 having a thickness of several 1μm is arranged to the region permitting heavy ion beam 9 to pass in the vacuum chamber 8 of a heavy ion accelerator. The beam 9 performs interaction along with the membrane 1 to excite a bound electron. The excited electron passes through the membrane 1 to emit light and returns to a ground state. This beam is condensed by a lens 2 to be formed into an image on a multichannel beam sensor 3. The sensor 3 measures a photon one at a time to measure the intensity distribution of beam. The beam is converted to an electric signal in the sensor 3 and the converted signal is amplified by an amplifier 5 and shaped in a waveform to be sent to a display apparatus 7 and a signal memory 6. The intensity distribution waveform of beam is obtained on the display apparatus 7 and, since this distribution of beam corresponds to that of the beam 9, the position of the beam 9 can be accurately measured.


Inventors:
TSUMAKI KOJI
Application Number:
JP1697888A
Publication Date:
August 03, 1989
Filing Date:
January 29, 1988
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G01T1/29; G21K5/04; (IPC1-7): G01T1/29; G21K5/04
Attorney, Agent or Firm:
Katsuo Ogawa (2 outside)