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Title:
POSITIONAL SHIFT DETECTOR FOR LAMINATED SUBSTRATE AND SEMICONDUCTOR MANUFACTURING DEVICE USING THE SAME, AND POSITIONAL SHIFT DETECTION METHOD FOR LAMINATED SUBSTRATE
Document Type and Number:
Japanese Patent JP2012007898
Kind Code:
A
Abstract:

To collectively determine a shift amount of a substrate center position, for a laminated substrate composed of two sets of vertically layered discoidal substrates, in element forming or the like.

Contour measurement means 3A detects a contour shape of two sets of superposed substrates 21, 22 from a projection image of a laminated substrate 2 in a thickness direction, while edge shape measurement means 4 detects respective edge shapes of the two sets of substrates 21, 22 from a projection image of the laminated substrate 2 in a tangential direction, at multiple points in a circumferential direction. Then, calculation means 6 detects shape data of either one of the substrate sets from a detection result of the contour measurement means 3 to determine a diameter and a center position, while as for the other substrate set, shape data is obtained from a relative positional relationship between the two sets of substrates detected by the edge shape measurement means 4, using the shape data of the other set of substrate as a standard, to determine a diameter and a center position. Thereafter, the shift amount is determined from a distance of the center position between the two sets of substrates.


Inventors:
AKAMATSU MASARU
IBA KUNIO
Application Number:
JP2010141464A
Publication Date:
January 12, 2012
Filing Date:
June 22, 2010
Export Citation:
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Assignee:
KOBELCO KAKEN KK
International Classes:
G01B11/24; G01B11/00; G06T1/00; H01L21/66
Domestic Patent References:
JPH06213620A1994-08-05
JP2002050749A2002-02-15
JP2002050749A2002-02-15
JPH06213620A1994-08-05
Foreign References:
WO2008018537A12008-02-14
WO2008018537A12008-02-14
Attorney, Agent or Firm:
Etsushi Kotani
Masataka Otani
Satoshi Sakurai