PURPOSE: To quickly position a substrate and a mask in a highly precise manner by a method wherein, after the position of an alignment mark has been detected, the mark is relatively moved to the position in the vicinity of the optical axis of a detection optical system based on the result of detection, and the position of the mark is redetected.
CONSTITUTION: The position of a positioning mark 4 is detected by processing the information obtained by image-pickup using an image treatment unit. Then, the deviation of the position of the positioning mark 4 against the optical axis 10 of a detection optical system 7 is computed based on the obtained result of detection and the correction value of the position of the positioning mark 4 is computed. The control signal corresponding to the above-mentioned correction value is inputted to a driving motors 6A and 6B. The positioning mark 4 is moved to the position in the vicinity of the optical axis 10 by the movement of a stage 3. Subsequently, the position of the positioning mark 4, which is image-formed on the position detecting sensor 8, is redetected when the positioning mark 4 is moved to the position in the vicinity of the optical axis 10.
NAKAMURA OSAMU
NARA KEI
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