To obtain a positive chemically amplifying photosensitive resin compsn. having high sensitivity, high resolution, little reduction of the film during developing, and good heat resistance with respect to such a positive chemically amplifying photosensitive resin compsn. that an acid is produced in a pattern latent image forming part by pattern irradiation of radiation such as UV rays, far UV rays, X-rays, electron beams or the like and that the solubility with an alkali developer is changed between the irradiated part and unirradiated part by the reaction using the acid as a catalyst to develop a pattern.
This positive chemically amplifying photosensitive resin compsn. contains (a) a resin soluble in an alkali aq. soln. synthesized by using a resorcinol as the source monomer, (b) a compd. which produces an acid by irradiation of activated actinic rays, (c) a vinyl polymer having acid decomposable groups which can be dissociated by acid catalyst reaction in the side chains and increasing in the solubility in an alkali aq. soln. by the dissociation of the acid decomposable groups, and (d) a solvent.
KATO KOJI
HASHIMOTO MASAHIRO
HASHIMOTO MICHIAKI
