Title:
POSITIVE PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3936503
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition which retains satisfactory intrasurface uniformity even in a thin film process and reproduces the desired resist pattern with high sensitivity and high resolving power.
SOLUTION: The positive photoresist composition contains a resin having a velocity of dissolution in an alkali developing solution increased by the action of an acid, a compound which generates the acid when irradiated with active light or radiation and a solvent and has 2-7 cP viscosity at 25°C.
Inventors:
Moto Nakao
Kenichiro Sato
Kazuya Uenishi
Kenichiro Sato
Kazuya Uenishi
Application Number:
JP32709199A
Publication Date:
June 27, 2007
Filing Date:
November 17, 1999
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/039; H01L21/027; C08F220/06; C08F220/16; C08F220/28; C08F220/38; C08F222/06; C08F222/12; C08F222/40; C08F232/08; C08K5/00; C08L33/04; C08L35/00; C08L35/02; C08L45/00; (IPC1-7): G03F7/039; C08F220/06; C08F220/16; C08F220/28; C08F220/38; C08F222/06; C08F222/12; C08F222/40; C08F232/08; C08K5/00; C08L33/04; C08L35/00; C08L35/02; C08L45/00; H01L21/027
Domestic Patent References:
| JP10223501A | ||||
| JP9507304A | ||||
| JP11231539A | ||||
| JP10078658A | ||||
| JP11265067A | ||||
| JP2001192569A | ||||
| JP2000275845A | ||||
| JP2001109157A | ||||
| JP10312060A | ||||
| JP6011607A | ||||
| JP7244376A |
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa
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