Title:
POSITIVE PHOTOSENSITIVE COMPOSITION AND CURED FILM USING THE SAME
Document Type and Number:
Japanese Patent JP2020109508
Kind Code:
A
Abstract:
To provide a positive photosensitive composition and a cured film using the same.SOLUTION: There is provided a positive photosensitive composition comprising (A) a siloxane copolymer and (B) a photo-active compound including a compound having a repeating unit represented by the formula 1. In the formula 1, A1 and A2 each independently is a hydrogen atom, a hydroxyl group, a phenol group, an alkyl group having 1 to 4 carbon atoms, an aryl group having 6 to 15 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, R1 is a hydrogen atom or a 1,2-naphthoquinonediazide-5-sulfonyl group and n is an integer of 3 to 15.SELECTED DRAWING: Figure 1
Inventors:
YANG JONG HAN
HUH GEUN
NA JONG HO
SHIN KAHEE
KIM YEONOK
HUH GEUN
NA JONG HO
SHIN KAHEE
KIM YEONOK
Application Number:
JP2019230897A
Publication Date:
July 16, 2020
Filing Date:
December 20, 2019
Export Citation:
Assignee:
ROHM & HAAS ELECTRONIC MAT KOREA LTD
International Classes:
G03F7/023; C08G59/40; G03F7/004; G03F7/075; G03F7/20
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office