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Patent Searching and Data


Title:
POSITIVE PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2003156846
Kind Code:
A
Abstract:

To solve the problem of a performance enhancing technique proper to microphotofabrication using far ultraviolet light, particularly ArF excimer laser light and to provide a positive photosensitive composition having excellent density dependence and side lobe margin.

The positive photosensitive composition comprises a compound which generates a fluorine-containing specified aromatic sulfonic acid upon irradiation with active ray or radiation and a resin which has specified repeating units of formulae (I) and (II) and is decomposed by the action of an acid to increase solubility in an alkali developing solution. In the formulae, R1-R8 may be the same or different and are each alkyl which may have a substituent, a cyclic hydrocarbon group which may have a substituent, halogen, cyano, -COOH, a group which is decomposed by the action of an acid or -C(=O-X-A- R9), two of R1-R4 may bond to each other to form a ring and two of R5-R8 may bond to each other to form a ring.


Inventors:
SATO KENICHIRO
KODAMA KUNIHIKO
Application Number:
JP2001354581A
Publication Date:
May 30, 2003
Filing Date:
November 20, 2001
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F232/00; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F232/00; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)