To solve the problem of a performance enhancing technique proper to microphotofabrication using far ultraviolet light, particularly ArF excimer laser light and to provide a positive photosensitive composition having excellent density dependence and side lobe margin.
The positive photosensitive composition comprises a compound which generates a fluorine-containing specified aromatic sulfonic acid upon irradiation with active ray or radiation and a resin which has specified repeating units of formulae (I) and (II) and is decomposed by the action of an acid to increase solubility in an alkali developing solution. In the formulae, R1-R8 may be the same or different and are each alkyl which may have a substituent, a cyclic hydrocarbon group which may have a substituent, halogen, cyano, -COOH, a group which is decomposed by the action of an acid or -C(=O-X-A- R9), two of R1-R4 may bond to each other to form a ring and two of R5-R8 may bond to each other to form a ring.
KODAMA KUNIHIKO