POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR ORGANIC INSULATING FILM, ORGANIC INSULATING FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE

Japanese Patent JP2011022509

A

To provide a positive photosensitive resin composition for an organic insulating film having a wide development margin and forming an interlayer insulating film excellent in transparency, solvent resistance, heat resistance, insulation stability and fitness for ITO, an organic insulating film using the same, and an organic EL display device and a liquid crystal display device including the organic insulating film.

The positive photosensitive resin composition for an organic insulating film contains: (A) an alkali-soluble resin; (B) a 1,2-quinonediazide compound; and (C) a compound having two or more vinyl ether groups or vinyl thioether groups per molecule.

JP4117037	Method for synthesizing polyphenol compound and positive photoresist composition containing polyphenol compound
JPH10186650	POSITIVE PHOTORESIST COMPOSITION
JP2594088	[Title of the Invention] A positive photosensitive resin composition and a method for producing the same.

KONDO SHUNICHI
ANDO TAKESHI
KAWABE YASUMASA

JP2009169380A

February 03, 2011

July 17, 2009

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FUJIFILM CORP

G03F7/023; C08F220/28; G03F7/004; H01L51/50

Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda

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