Title:
POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM OR X RAY
Document Type and Number:
Japanese Patent JP2002341538
Kind Code:
A
Abstract:
To provide a positive resist composition for electron beams or X rays having high sensitivity, high resolution and excellent stability of PED(post exposure delay).
The positive resist composition for electron beams or X rays contains (a) a compound which produces an acid by irradiation with electron beams or X rays, (b) a resin which increases the solubility to an alkali developer by the effect of an acid, (c) a low molecular weight compound stable against acid and having a residue of a compound showing the ionization potential (Ip) lower than the Ip of p-ethylphenol, and (d) a solvent.
Inventors:
SASAKI TOMOYA
MIZUTANI KAZUYOSHI
SHIRAKAWA KOJI
MIZUTANI KAZUYOSHI
SHIRAKAWA KOJI
Application Number:
JP2001142185A
Publication Date:
November 27, 2002
Filing Date:
May 11, 2001
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri (4 outside)
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