POSITIVE RESIST COMPOSITION FOR LIFT-OFF METHOD AND PATTERN FORMING METHOD

Title:

POSITIVE RESIST COMPOSITION FOR LIFT-OFF METHOD AND PATTERN FORMING METHOD

Document Type and Number:

Japanese Patent JP2973874

Kind Code:

B2

Abstract:

PURPOSE: To provide a resist compsn. capable of forming a resist pattern ensuring high working precision and high reliability by a lift-off method and to provide a pattern forming method.
CONSTITUTION: A positive resist compsn. contg. novolak resin having repeating units represented by formula I as an alkali-soluble resin, a low nuclear body represented by formula II or III and having phenolic hydroxyl groups and 2-5 benzene rings as a dissolution inhibitor and a compd. having a 1,2- naphthoquinonediazido group represented by formula IV or V as a photosensitive agent is exposed and developed to form a resist pattern of a prescribed shape. In the formulae II, III, (i) is 1 or 2, each of (k), (m) and (p) is an integer of 0 to 3, (n) is an integer of 1 to 4, (q) is an integer of 1 to 3, (r) is 2 or 3, m+p+n≤6 and k+q≤5.

More Like This:

JP2020166212	CURABLE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND PRINTED WIRING BOARD
WO/2015/125514	ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
JP5255847	Photosensitive dry film resist, printed wiring board using this, and manufacturing method of printed wiring board

Inventors:

OKAZAKI SATOSHI
NISHIKAWA KAZUHIRO
KOBAYASHI MASARU
KOBAYASHI YOSHITAKA
UMEMURA MITSUO
ISHIHARA TOSHINOBU

Application Number:

JP16929995A

Publication Date:

November 08, 1999

Filing Date:

June 12, 1995

Export Citation:

Click for automatic bibliography generation Help

Assignee:

SHINETSU KAGAKU KOGYO KK

International Classes:

G03F7/004; G03F7/022; G03F7/023; G03F7/26; H01L21/027; H01L21/3205; (IPC1-7): G03F7/26; G03F7/004; G03F7/022; G03F7/023; H01L21/027; H01L21/3205

Domestic Patent References:

JP667418A
JP4299348A
JP411260A
JP3230164A
JP659445A
JP5204143A
JP4122938A
JP5323605A
JP210350A
JP3236216A
JP335654B2

Attorney, Agent or Firm:

Takashi Kojima

Previous Patent: FRAME SYNCHRONIZING SYSTEM AND FRAME SYNCHRONIZING CIRCUIT

Next Patent: COMPOUND SEMICONDUCTOR MEMORY