Title:
POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2007127691
Kind Code:
A
Abstract:
To provide a positive resist composition capable of forming a resist pattern of a good profile.
The positive resist composition is a chemically amplified positive composition which comprises a copolymer having a unit comprising an acetal or ketal ester of (meth)acrylic acid and a (meth)acrylic ester unit having an acetal or ketal ester by way of a divalent bridged alicyclic group as a resin component having alkali solubility increased by the action of an acid, an acid generator and an aromatic solvent.
Inventors:
WATABE RYOJI
SESHIMO TAKEHIRO
SESHIMO TAKEHIRO
Application Number:
JP2005318164A
Publication Date:
May 24, 2007
Filing Date:
November 01, 2005
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/039; C08F220/28; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Masakazu Aoyama
Suzuki Mitsuyoshi
Noriko Yanai
Masatake Shiga
Masakazu Aoyama
Suzuki Mitsuyoshi
Noriko Yanai
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