ポジ型レジスト組成物、樹脂および重合性化合物、それを用いたパターン形成方法

Title:

ポジ型レジスト組成物、樹脂および重合性化合物、それを用いたパターン形成方法

Document Type and Number:

Japanese Patent JP5150109

Kind Code:

B2

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Inventors:

Yuko Yoshida

Application Number:

JP2007040997A

Publication Date:

February 20, 2013

Filing Date:

February 21, 2007

Export Citation:

Assignee:

FUJIFILM Corporation

International Classes:

G03F7/039; C08F220/28; H01L21/027

Domestic Patent References:

Attorney, Agent or Firm:

Takeshi Takamatsu
Toshiyuki Ozawa
Hasegawa Hiromichi

Previous Patent: JPS5150108

Next Patent: JPS5150110