Title:
POSITIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2004117677
Kind Code:
A
Abstract:
To provide a positive resist composition which significantly decreases the occurrence of development defects and with which an excellent square profile can be obtained.
The positive resist composition contains: (A) a resin which contains a repeating unit having a specified partial structure with an alicyclic hydrocarbon in the side chain or a repeating unit having an alicyclic hydrocarbon in the main chain, and which increases the solubility in an alkali developer solution by the effect of an acid; (B) a compound which generates an acid by irradiation with active rays or radiation; and (C) a specified compound having a long-chain alkyl group.
Inventors:
FUJIMORI TORU
Application Number:
JP2002279190A
Publication Date:
April 15, 2004
Filing Date:
September 25, 2002
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/039; C08F20/18; C08F32/08; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; C08F20/18; C08F32/08; G03F7/004; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Kuriu
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Yuriko Kuriu
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