POSITIVE RESIST COMPOSITION - FUJIFILM Corporation

Title:

POSITIVE RESIST COMPOSITION

Document Type and Number:

Japanese Patent JP3909829

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a positive resist composition having satisfactory transmittance at the time of using an exposure light source of ≤160 nm, concretely F2 excimer laser light (157 nm) and improved in line edge roughness and development defects.
SOLUTION: The positive resist composition comprises (A) a compound which generates an acid upon irradiation with an actinic ray or a radiation, (B) an organic fluoropolymer which has at least one structure selected from formulae (I)-(III) and whose solubility in an alkali developer is increased by the action of an acid and (C) a solvent.

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Inventors:

Kazuyoshi Mizutani
Shinichi Kanna
Tomoya Sasaki

Application Number:

JP2002074305A

Publication Date:

April 25, 2007

Filing Date:

March 18, 2002

Export Citation:

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Assignee:

FUJIFILM Corporation

International Classes:

G03F7/039; C08F232/00; H01L21/027; (IPC1-7): G03F7/039; C08F232/00; H01L21/027

Domestic Patent References:

JP2003107706A
JP2003177539A
JP2003192729A
JP2002201219A

Foreign References:

WO2001063362A1
WO2001037047A1
WO2000067072A1

Attorney, Agent or Firm:

Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa

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