PURPOSE: To obtain the subject composition capable of forming a photo-resist having good residual film ratio and storage stability and excellent photosensitive characteristics and mechanical properties by compounding a specific acid- neutralized (meth)acrylic resin with a photo-sensitive agent consisting of two specific kinds of compounds.
CONSTITUTION: The objective composition is produced by compounding (A) a resin produced by copolymerizing, as essential monomer components, a polymerizable monomer of formula I (R1 is H or methyl; R2 and R3 are H or alkyl; n is integer of 1-6) and a polymerizable monomer giving a homopolymer having a glass-transition point of <≤0°C and neutralizing the obtained (meth)acrylic resin with an acid and (B) a photo-sensitive agent consisting of (i) a compound of formula II (R4 is alkyl; R5 is H, alkyl, alkoxy or nitro; R6 is group of formula III to V; m is 0, 1 or 2; n is 1, 2 or 3; m+n is 1, 2 or 3) and (ii) a compound of formula IV (R7 is alkyl; R8 is H, alkyl, alkoxy or nitro; R9 is group of formula VII to formula IX; s is 0, 1 or 2; t is 1, 2 or 3; s+t is 1, 2 or 3).
TACHIKI SHIGEO
AKAHORI SATOHIKO
KATO TAKURO
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