Title:
ポジ型フォトレジスト組成物
Document Type and Number:
Japanese Patent JP4139548
Kind Code:
B2
Abstract:
Provided is a positive photoresist composition for use in the production of a semiconductor device, which ensures high resolution, reduced edge roughness of a line pattern and a small number of development defects. The positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an alkali developer increases under the action of an acid.
Inventors:
Tomoya Sasaki
Kazuyoshi Mizutani
Shoichiro Anami
Kazuyoshi Mizutani
Shoichiro Anami
Application Number:
JP2000105299A
Publication Date:
August 27, 2008
Filing Date:
April 06, 2000
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/039; C08L33/00; C08L33/06; C08L33/14; C08L35/00; C08L43/04; G03F7/004; G03F7/075; H01L21/027
Domestic Patent References:
| JP11231542A | ||||
| JP5011450A | ||||
| JP2000026548A | ||||
| JP8022125A | ||||
| JP1110513A | ||||
| JP11338151A |
Attorney, Agent or Firm:
Takeshi Takamatsu
Kiyozumi Yazawa
Kiyozumi Yazawa